Selecting the right polishing pad is essential for achieving precise, repeatable surface finishes. Pads vary in nap height, backing type, and material composition, which impacts abrasive support, flatness, and edge retention.
Choosing the correct pad minimizes artifacts such as edge rounding, relief, and smear, ensuring accurate microstructural analysis.
Backing option: Pads with PSA (adhesive).
NAPPAD is a very high-napped final polishing pad tailored for soft metals and polymers. Provides gentle polishing action to minimize pull-out and relief.