Selecting the right polishing pad is essential for achieving precise, repeatable surface finishes. Pads vary in nap height, backing type, and material composition, which impacts abrasive support, flatness, and edge retention.
Choosing the correct pad minimizes artifacts such as edge rounding, relief, and smear, ensuring accurate microstructural analysis.
Backing option: Pads with PSA (adhesive).
Black CHEM 2 is a porometric polymer pad with rubber-like consistency, offering balanced action between low and high nap pads. Ideal for moderate nap intermediate polishing.